AR膜系-硅鋁靶材-高純3~6NSiAI-low-E鍍膜玻璃材料
價格
訂貨量(根)
¥40000.00
≥10
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钳钴钶钼钼钳钻钸钴钸钻
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噴涂硅鋁靶材 Spray SiAl Target
產品說明Product description
以等離子體為熱源,在大氣環境下通過一定的氣氛保護裝置,將Si+Al粉末加熱到熔融或半熔融狀態并高速沖擊背管表面形成致密涂層,從而制備出高純度、低氧含量、高致密度SiAl靶材。
With plasma as the heat source, high purity, low oxygen content, high density SiAl targets are produced by using Si and Al powders. The starting Si and Al powders are heated to molten or semi-molten state with the protection of certain atmosphere and sprayed on the surface of backing tube at high speeds to form dense coatings.
項目 Item | 參數 Specifications | 檢測手段 Testing method |
純度 Purity | ≥99.9% |
|
Al含量 Al Content | 8-10% |
|
密度 Density | ≥2.2 g/cm3 |
|
雜質含量 Impurities | Fe: ≤350 ppm Ca: ≤50 ppm Cu: ≤50 ppm Mg: ≤20 ppm Ni: ≤20 ppm O: ≤6000 ppm N: ≤500 ppm 雜質總和(O、N除外): ≤1000 ppm Total impurity (excluding O, N) | ICP 氧氮分析儀 Oxygen and nitrogen analyzer
|
電阻率 Electrical resistivity | ≤50 mΩ?cm | 四探針電阻率儀 Four-probe resistivity meter |
背管材質 Backing tube
-選用304/316L不銹鋼(無磁)
304/316L stainless steel (non-magnetic)
靶材尺寸Dimension
-按照圖紙要求加工
According to customized drawings
應用領域Applications
-用于制作SiO2膜、Si3N4膜,主要用于光學玻璃AR膜,LOW-E鍍膜玻璃,半導體電子器件,TFT-LCD,平面顯示,觸摸屏玻璃。
For deposition of SiO2 and Si3N4 films, which are used for AR films of optical glasses, LOW-E glasses, electronic devices, TFT-LCD, flat panel screens, touch screen glasses.